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		<title>Diffusion on Infrared Heating Applications</title>
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				<title>Semiconductor diffusion furnace lamp</title>
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				<pubDate>Mon, 01 Jun 2026 02:47:33 +0800</pubDate>
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				<description>&lt;p&gt;&lt;img src=&#34;http://ir-heating-case.com/images/e619a459508a95cd74ea4eae0be40cd1.png&#34; alt=&#34;Semiconductor diffusion furnace lamp&#34;&gt;&lt;/p&gt;&#xA;&lt;p&gt;On the fab floor, the furnace isn’t a black box. It’s a tightly controlled thermal boundary. If the lamp array starts to underperform, the temperature map across the wafer drifts. Photoresist profiles shift. Oxide thickness variance widens. Yield drops—quietly, and in the numbers.&#xA;We build diffusion furnace lamps for one reason: deliver stable, repeatable heat where the process needs it, without adding contamination risk. The lamp is the interface between electrical energy and the wafer’s thermal budget. It has to be precise, clean, and dependable—shift after shift.&lt;/p&gt;</description>
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